| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_305959bf5cf061d331f116116c20aec6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67706
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68728
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6838
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68707
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67718
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67184
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 |
| filingDate |
2021-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba3b1b5b7b40b14c29a3b2c50e053282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff9960413e92ae94966ed9fbdf07e5a7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aefc8163515d88549b8ae41b9b9a1880 |
| publicationDate |
2022-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-114695184-A |
| titleOfInvention |
Substrate processing system and substrate processing method |
| abstract |
The present invention relates to a substrate processing system and a substrate processing method. The substrate processing system includes a first substrate holding unit including a first susceptor facing from below a substrate having a surface to be protected and a surface to be cleaned on a side opposite to the protected surface, and the substrate is held The bottom is held in a first posture with the surface to be protected facing upward; a protective film coating nozzle applies at least to the peripheral edge of the surface to be protected of the substrate held by the first substrate holding unit cloth protective film; and a first inversion unit for inverting the substrate in contact with the peripheral edge portion of the substrate so that the posture of the substrate is changed from the first posture so that the surface to be protected faces downward a second posture of the The surface to be cleaned of the substrate held by the second substrate holding unit is cleaned. |
| priorityDate |
2020-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |