| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_86dd6dbb7bad94ae9fb9e0ca81af3950 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2021-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e74fed562aa29e043b7aa215a191419 |
| publicationDate |
2022-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-114690553-A |
| titleOfInvention |
Photoacid generator, photoresist composition, and pattern forming method |
| abstract |
A photoacid generator is disclosed comprising a moiety having formula (1): wherein: Ar 1 is a substituted or unsubstituted aryl group; R 1 is an alkyl or aryl group, each of which may be substituted or unsubstituted, wherein Ar 1 and R 1 are optionally linked by a single bond or divalent The groups are linked together to form a ring; Y is a single bond or a divalent group; and * is the point of attachment of the moiety to another atom of the photoacid generator. These photoacid generator compounds are particularly useful in photoresist compositions that can be used to form lithographic patterns that are used to form electronic devices. |
| priorityDate |
2020-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |