| abstract |
The purpose of the present invention is to provide a chemical mechanical polishing liquid for tungsten polishing, including: chloroquine corrosion inhibitor, water, abrasive particles, catalyst, stabilizer, oxidant and pH adjuster. The chemical mechanical polishing liquid provided by the present invention can provide a higher polishing speed of tungsten and a moderate polishing speed of silicon oxide. Most importantly, the composition exhibits low tungsten static corrosion, which in turn improves polished metal surface condition. |