| abstract |
The present application provides a method for preparing a photoanode for a fabric substrate, which includes: plating a copper-nickel coating on a polyester fabric to form a fabric substrate; after cleaning the fabric substrate, evenly smearing anode slurry at a preset position and drying it naturally; then Incubate for 20 minutes at a temperature of 400 degrees, and after annealing, put N719 sensitizing dye in the dark for 24 hours to form an anode film. In the present application, the copper-nickel coating is plated on the polyester fabric, so that the photoanode has a certain flexibility and at the same time has a higher light conversion efficiency. |