| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3c5743a2eb1f90d8d75adc3b93f26c32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e53cf9cd320442ada52dd68b0c2ca9bd |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-456
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4933
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-092
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823814 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66659
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-6659
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7833
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-665
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66492
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7835
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28518
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-0924
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4933
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-092
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823821
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823814 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-092 |
| filingDate |
2020-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a30b82c00433a75403c88fabd71d017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9801352267cd309c5c83b94ed27872b2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fcf56945994a1602066e76841bea1fd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8f853871acb929ddd7f6cf7ea3b320b |
| publicationDate |
2022-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-114496923-A |
| titleOfInvention |
Semiconductor component and method of forming the same |
| abstract |
The present disclosure relates to semiconductor components and methods of forming the same. A method of forming a semiconductor device includes: forming a gate structure on a substrate; forming a first gate spacer and a second gate spacer on opposite sidewalls of the gate structure respectively; implanting a first gate spacer in the substrate a first dopant of conductivity type to form a lightly doped source region adjacent to the first gate spacer and a lightly doped drain region adjacent to the second gate spacer; in the lightly doped forming a patterned shield over a first portion of the drain region and leaving a second portion of the lightly doped drain region exposed; and implanting the first conductivity type in the substrate in the presence of the patterned shield of the second dopant, so that the second portion of the lightly doped drain region is transformed into a drain region. |
| priorityDate |
2020-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |