http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114420785-A

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filingDate 2021-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99c2028016c876034d8bc6654d1932bc
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publicationDate 2022-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-114420785-A
titleOfInvention Layered oxychalcogenide composite CdS photoelectric material and preparation method and application
abstract The invention relates to a composite optoelectronic material, in particular to a layered oxychalcogenide compound CdS optoelectronic material, a preparation method and application thereof, comprising the following steps: S1: cleaning a conductive substrate; S2: obtaining the cleaned conductive substrate obtained in step S1 A CdS film is prepared on a conductive substrate; S3: configure an oxychalcogenide slurry, spin-coat on the CdS film obtained in step S2 and vacuum anneal; S4: screen-print silver paste on the composite film obtained in step S3 as a The back electrode is used to obtain the layered oxychalcogenide compound CdS photoelectric material, the structure of which is, from bottom to top, a conductive substrate, a CdS film, an oxychalcogenide film and an Ag electrode. Compared with the prior art, the present invention combines the layered oxychalcogenide compound CdS to prepare a thin film optoelectronic material with a heterostructure. Due to the built-in potential at the heterointerface, the recombination of carriers can be effectively suppressed and the optoelectronic performance can be realized. a substantial increase.
priorityDate 2021-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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