| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ba36389bb77990f8a81c0c18142314d8 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3321 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0272
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32467
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45555
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32495
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate |
2020-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c6d642e97f34211c61bc23657c55845
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92d9640e0198d35f57cede02d5a09602
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5177c4b492a3a889d16e7fe0dfab14ce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_878b0898b5f67b360a8231366538b141 |
| publicationDate |
2022-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-114375348-A |
| titleOfInvention |
Method for forming protective coatings on process chamber surfaces or components |
| abstract |
Embodiments of the present disclosure provide methods of fabricating or otherwise forming a protective coating comprising ceria on process chamber surfaces and/or components such as plasma exposed within the process chamber body surface. In one or more embodiments, a method of forming a protective coating within a process chamber includes depositing a ceria layer on a chamber surface or chamber component during an atomic layer deposition (ALD) process. The ALD process involves sequentially exposing a chamber surface or chamber component to a cerium precursor, a purge gas, an oxidant, and a purge gas in one ALD cycle, and repeating the ALD cycle to deposit a cerium oxide layer. |
| priorityDate |
2019-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |