| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ea6a40b343733c29ec051d5267058f29 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-6428
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
2020-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00aaceccb84d5b95c64b755e7e158388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af0f04fb9c436bc5ca529a494a0548e4 |
| publicationDate |
2022-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-114207519-A |
| titleOfInvention |
Resin composition and flow cell incorporating the resin composition |
| abstract |
An exemplary resin composition includes an epoxy resin matrix, a first photoacid generator, and a second photoacid generator. The first photoacid generator includes an anion having a molecular weight of less than about 250 g/mol. The second photoacid generator includes an anion having a molecular weight greater than about 300 g/mol. In one example, i) the cation of the first photoacid generator, or ii) the cation of the second photoacid generator, or iii) the cation of the first photoacid generator and the second photoacid generator It has a mass attenuation coefficient of at least 0.1 L/(g*cm) at the wavelength of incident light for curing the resin composition. |
| priorityDate |
2019-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |