| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c63f4fa5b499ae2010acb5b64d225f9c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-88 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G41-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G39-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G41-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G39-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G41-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G39-00 |
| filingDate |
2020-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1158a808bc1f4f9848107e94ca6b90f1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06ea4c9c044edcdd314c44210a392e7a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_980c1cfa65156c89629b8dfd7c77aa33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0fe0414fd752eb77537c7f30acdd5cf5 |
| publicationDate |
2022-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-114174216-A |
| titleOfInvention |
Oxyhalide precursor |
| abstract |
The present invention provides a method of preparing molybdenum and tungsten oxyhalide compounds suitable for depositing molybdenum and tungsten containing thin films on various surfaces of microelectronic devices. In the process of the present invention, molybdenum trioxide or tungsten trioxide is heated in a solid medium or in a melt phase reaction comprising a eutectic admixture comprising an alkali metal salt and/or an alkaline earth metal salt. The molybdenum or tungsten oxyhalide thus formed can be isolated in vapor form and crystallized to provide a high purity precursor compound such as MoO2Cl2 . |
| priorityDate |
2019-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |