http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114114839-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_92ee0f4cf085d6a76da5997d8d87a3d3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a5e333bd7861fead95d0962983865e16 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2020-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b6a5f744ff06eaab1bbd6d8828d1dd4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c3c5edcfd19ed4308902329afa05eb9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fff3bf4587f48cd4a6388ad01f34f8b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b72d76093b3d8f0714d5b18605e4793f |
| publicationDate | 2022-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-114114839-A |
| titleOfInvention | Photosensitive resin composition, patterning method and application of photosensitive resin composition |
| abstract | The invention provides a photosensitive resin composition, a patterning method and application of the photosensitive resin composition. The photosensitive resin composition comprises a resin component and an acid generator, wherein the acid generator is a sulfimide photo-acid generator, and the sulfimide photo-acid generator has a structure shown in the following general formula (A): the molecules of the sulfonyl imide photo-acid generator with the general formula (A) contain sulfonate groups, the sulfonate groups are directly connected with an imide structure, and the structure has a photosensitive cracking characteristic and can be photolyzed under the irradiation of active energy rays to generate stronger sulfonic acid. Will feelWhen the photosensitive resin composition is used for a positive photosensitive composition subjected to dissolution exposure with an alkali developer, a pattern having excellent sensitivity and good contrast can be formed due to the increase in sensitivity of the sulfimide photoacid generator, and a sufficiently high sensitivity can be obtained even when a fine pattern is formed. |
| priorityDate | 2020-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 590.