http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114075334-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e72cccf41f0b6a4dfe2745d6a0153d01 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K2211-1433 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K2211-1425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K2211-1416 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K11-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A01N41-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01P1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01N41-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K11-06 |
| filingDate | 2021-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5aead5cfd5248c4040199ac31d5da77e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d8c0d88947fa698584cb9680325df46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d24e372e5095bf85da4e41fea178de64 |
| publicationDate | 2022-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-114075334-A |
| titleOfInvention | Synthesis method and application of photoresponse polysulfonate |
| abstract | The invention provides a novel method for synthesizing photoresponse polysulfonate under mild conditions, and application of the photodegradation and photoacid generation properties of the polysulfonate in fluorescent multicolor two-dimensional patterns, fluorescent three-dimensional pattern generation and broad-spectrum antibiosis. The polymerization route takes simple and easily obtained diyne halide and cheap disulfonic acid as raw materials, and prepares the polysulfonate efficiently at room temperature by a one-pot method in the air atmosphere without a catalyst, the yield reaches 94 percent, and the atom utilization rate is 100 percent. Compared with the traditional photoresponse polymer synthesis method, the method does not need to utilize photosensitive monomers, has short reaction time, simple operation and extremely mild conditions. The method not only provides a new photoresponse polymer synthesis strategy, but also enriches the variety of photoresponse polymers. |
| priorityDate | 2020-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 57.