http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114015360-B
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
filingDate | 2021-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2022-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2022-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-114015360-B |
titleOfInvention | A kind of water-based fully suspended diamond polishing liquid for sapphire, its preparation method and use |
abstract | The invention provides a water-based fully suspended diamond polishing liquid for sapphire, a preparation method and application thereof. The water-based fully-suspended diamond polishing liquid for sapphire of the present invention comprises the following components by mass ratio: 1-10 parts of suspending agent; 1-10 parts of dispersing agent; 10-15 parts of complexing agent; 0.1-0.5 part of rust inhibitor; 1-5 parts of wetting agent; 0.1-1 part of defoamer; 50-80 parts of ultrapure water; 0.1-0.5 part of diamond powder. The components used in the water-based fully suspended diamond polishing solution for sapphire of the present invention are inexpensive and belong to green environmental protection reagents, which do not cause harm to operators and the natural environment, and is beneficial to protecting polishing equipment. The polishing liquid of the invention has excellent polishing effect, simple composition, low price, and no harm to operators and the environment. The polishing liquid of the present invention is a full suspension system, which avoids the problems of scratches caused by the agglomeration of diamond powder and the reduction of the removal rate to the greatest extent. |
priorityDate | 2021-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 38.