| abstract |
The present invention relates to novel negative photoresist compositions and methods of use. The invention further relates to multi-trigger photoresist processes that in some systems can improve contrast, resolution and/or line edge roughness without any impact on sensitivity. The photoresist compositions of the present invention and methods of use thereof are ideal for fine patterning using UV radiation, EUV radiation, EUV radiation, X-rays and charged particles. The present invention further relates to sensitizing materials suitable for use in the disclosed compositions and methods of their use. |