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filingDate 2020-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2a428ee545a88915035a720027aae53
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publicationDate 2022-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-113939896-A
titleOfInvention Low-K Dielectrics with Self-Shaping Barriers
abstract A method of forming a low-k dielectric layer with barrier properties is disclosed. The method includes forming a dielectric layer doped with one or more of boron, nitrogen, or phosphorous by PECVD. The dopant gas of some embodiments may co-flow with other reactants during deposition.
priorityDate 2019-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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