http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113929624-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4fdc8abc5b817141b50c3d01d185c993 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ac7c032063aa624c4fb86e8a22fa0a20 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D231-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D231-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2020-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a725075ae8b133bc75aa370d1154d4d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_914f6633ab8244d924f8ac0e3cd19224 |
| publicationDate | 2022-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-113929624-A |
| titleOfInvention | A kind of pyrazoline compound, photosensitive resin composition and patterning method |
| abstract | The invention provides a pyrazoline compound, a photosensitive resin composition and a patterning method. The pyrazoline compound has the structure shown in the general formula I, wherein R 1 , R 2 and R 3 each independently represent H, halogen, carboxyl, nitro, cyano, amine, hydroxyl, C 1 -C 20 alkyl group, C 1 -C 10 alkoxy group, C 1 -C 10 alkyl ester group, C 1 -C 20 alkylamine group, any one or more groups, and each group The methylene group in can be optionally substituted by oxygen, sulfur and imino groups; a represents any integer from 0 to 4, b represents any integer from 0 to 3, and c represents any one from 0 to 5 Integer. The absorption band of the above-mentioned pyrazoline compounds is 380-410 nm, which is suitable for use as a sensitizer, and can greatly improve the sensitivity of the photocuring system. The above-mentioned pyrazoline compounds can make the composition have the characteristics of high sensitivity, high resolution and high adhesion. |
| priorityDate | 2020-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 380.