http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113916832-A

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filingDate 2021-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07b1ec4a6251e5f8cc13469c6e500709
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publicationDate 2022-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-113916832-A
titleOfInvention All-dielectric defect cylindrical high-quality-factor refractive index sensor and manufacturing method thereof
abstract The invention relates to the technical field of optical devices, in particular to an all-dielectric defect cylindrical high-quality-factor refractive index sensor and a manufacturing method thereof. The all-dielectric super-surface structure unit is a semi-cylindrical structure body with an upward cambered surface, and the axis of the semi-cylindrical structure body is parallel to the x axis; wherein, the x-axis is along the width direction of the silicon dioxide substrate, the y-axis is along the length direction of the silicon dioxide substrate, and the z-axis is along the thickness direction of the silicon dioxide substrate. The quality factor of the all-dielectric sensor is greatly improved, and the resolution of the all-dielectric super-surface sensor is further improved.
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Total number of triples: 24.