http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113878504-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d25a923320c14aa86e17ed16e1d905e6 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D11-001 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D11-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-00 |
| filingDate | 2021-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc492661f47ea886cb819f15bc62b79d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53665e1eea99965ad9747a971ddb9be2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00f9245c3e437afbadfbc62a5820f5c6 |
| publicationDate | 2022-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-113878504-A |
| titleOfInvention | A kind of display screen polishing and cleaning pad and preparation method thereof |
| abstract | The present invention provides a screen polishing and cleaning pad, which includes a base material and a slurry, wherein the base material is a polyurethane filter sponge, and the slurry includes a bottom slurry and a top slurry, and the components of the bottom slurry and the top slurry are the same. Including: 0%-40% of cerium oxide abrasive; 1%-3% of silane coupling agent; 40%-80% of polyurethane adhesive; 5%-30% of ethyl acetate solvent; 0.1%-0.3% of thickener. Compared with the existing display screen polishing tool, the present invention has more excellent rigidity and elasticity, wear resistance, grinding force, anti-pulling force and not easy to rot, etc., and also has the "self-contained" characteristics that polishing leather and polishing leather do not have. "Clean" function, because of its large porosity, polishing dust is easy to go out from the gap, generally adding water to throw, water can take away the dust, and it is not easy to accumulate powder to damage the workpiece. |
| priorityDate | 2021-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.