| abstract |
The invention discloses a self-cleaning antireflection film for moon dust protection and a preparation method thereof, belonging to the technical field of functional material preparation. The invention solves the technical problem that the existing anti-reflection film used for moon dust protection cannot have both self-cleaning performance and transmittance at the same time. In the present invention, a sol-gel method is used to prepare silica sol, which is mixed with a silica dispersion and then spin-coated on a glass substrate. In order to reduce the surface energy of the coating, fluorine is grafted on the surface by thermal evaporation. While ensuring the coating has a certain degree of surface roughness, it also has a good anti-reflection effect. In addition, the present application adopts the method of thermal evaporation to graft fluorine on the surface, and while obtaining a superhydrophobic surface, it does not leave traces on the surface, and has good anhydrous self-cleaning effect and good anhydrous self-cleaning effect. |