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publicationDate 2021-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-113631561-A
titleOfInvention Metal complexes for vapor phase thin film deposition
abstract The invention describes metal complexes of formula (I): [ M (L) 1 ) x (L 2 ) y (hydra) z ] n Formula (I) wherein: m ═ a metal atom having an atomic number selected from the ranges a) to c): a)12, 21 to 34, except 30, b)39 to 52, except 48, c)71 to 83, except 80, L 1 Neutral or anionic ligands, wherein x is 0 or 1, L 2 A neutral or anionic ligand, wherein y is 0 or 1, (hydra)) Acetone dimethylhydrazone monoanion, wherein z is 1,2 or 3, n is 1 or 2, and the total charge of the complex is 0.
priorityDate 2019-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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