http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113621374-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7b9cce7ceaf283c17c08c82d5642b405 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00539 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 |
| filingDate | 2021-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_731509a80bc7ec2f6ef4ceb16bb654d5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9120110df0f9a8d88d8150bd2337b863 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1007ac86b49ef7878ed536cd39c82d50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_593d1d3b76c8340a13a1a77b2e5e35b1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5a3ffa7446bed3e0aa279427b9aa63d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da2be64e54960b731650bd2c39c31dab |
| publicationDate | 2021-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-113621374-A |
| titleOfInvention | Corrosion solution and method for small hole corrosion of infrared detectors |
| abstract | The present invention provides a corrosion solution for small hole corrosion of infrared detectors, which includes water as a solvent and solutes dissolved in water, and the solutes include hydrochloric acid, acetic acid and zinc chloride. In addition, the present invention also provides a small hole etching method for infrared detectors, which comprises depositing a zinc sulfide layer on the sacrificial layer of the substrate as an antireflection film; depositing an amorphous silicon layer on the zinc sulfide layer as an infrared transmission layer and a sulfide layer A hard mask for zinc wet etching; photolithography, dry etching and degumming are performed on the amorphous silicon layer to obtain a release hole precursor; monolithic wet etching is performed on the zinc sulfide layer with the above etching solution to obtain the required holes. In the invention, hydrochloric acid is used as a corrosive agent, and water, acetic acid and zinc chloride are introduced into the hydrochloric acid as diluents, buffers and protective agents, respectively, so as to effectively avoid the floating glue phenomenon in the wet corrosion process of zinc sulfide, and significantly improve the zinc sulfide. The serious problem of lateral undercutting solves the problem of wet corrosion of micro-sized holes. |
| priorityDate | 2021-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.