http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113592937-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2ed42caafc7d3114269eb7c083ca9d12 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-30148 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-10024 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q60-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-60 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01Q60-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T7-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T7-60 |
| filingDate | 2021-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a60d672eaa60127050c23ba887f75a5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17186991403355fc9ba4491be190eea6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f554fd9660fd3fecc033288e02c47cbc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31be91e69b52a49d08e522f0e8c51655 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85f516042f3daa5e0ba71c210b941559 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86076d1a26ca80a011c4e46f11b02344 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c83ced5a5b0b5a4d601d89f2060c2fc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_115a666cab88cd67e92adad0dfdae5b5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_791567d2cb39e2bea623ac6866078a4d |
| publicationDate | 2021-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-113592937-A |
| titleOfInvention | Atomic step width calculation device, method, apparatus and medium for semiconductor substrate |
| abstract | The embodiment of the specification discloses an atomic step width calculation device, method, equipment and medium of a semiconductor substrate, wherein the semiconductor substrate has one or more regions in which atomic steps are uniformly distributed in parallel, each atomic step is in an inclined state, and the width of each atomic step is the distance between two adjacent atomic steps, and the atomic step width calculation device comprises: the image acquisition unit is used for determining the test range of the semiconductor substrate and acquiring the original image of the atomic step corresponding to the semiconductor substrate in the test range; the image processing unit is used for carrying out gray level processing on the original atomic step image and determining an atomic step gray level image; the calculation unit is used for calculating the width of the atomic step according to the distance between two adjacent atomic steps in the atomic step gray level image and the size of the atomic step gray level image, so that the manpower and material resources for manual measurement and calculation are saved, the measurement error caused by manual calculation of the width is avoided, the calculation can be realized through a program, and the subjective error of manual measurement and calculation cannot be introduced. |
| priorityDate | 2021-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.