| abstract |
The invention relates to the technical field of photoresist, and discloses a degradable resin monomer synthesized from 2-cyclopentylcyclopentanone and a preparation method and application thereof. The general structural formula of the degradable resin monomer is as follows : wherein R is alkyl or heteroalkyl. The degradable resin monomer contains a tert-butyl structure. When exposed to light, the photoacid generator will generate acid. Under the action of the acid, the tert-butyl structure will be broken, resulting in the breaking of the main polymer chain and the formation of small fragments. , can improve the edge roughness of the photolithography pattern, improve the resolution of the photoresist, and form a hydroxyl group with good alkali solubility after disconnection, which is conducive to the dissolution during the development process, and increases the photoresist after exposure. speed, increasing the contrast of the photoresist. |