http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113419401-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed69c2d8f0b6e166be0903cab778327d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-284 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-4829 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-7671 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-48 |
| filingDate | 2021-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_262bcca6a03f8077d834dc1c91142e1f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a61a0c5d9ebe5d44624bfdb563eb95b9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1cf9c61fc5d7125f85567a6b7e30c8d |
| publicationDate | 2021-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-113419401-A |
| titleOfInvention | Photosensitive emulsion for heat-sensitive positive image CTP plate and preparation method thereof |
| abstract | The invention discloses a photosensitive emulsion for a heat-sensitive positive CTP plate and a preparation method thereof, which relate to the field of CTP plate materials, and form a photosensitive emulsion by taking matrix resin and film-forming resin as main raw materials and well proportioning the matrix resin and the film-forming resin with other raw materials from a photosensitive layer of the CTP plate; the preparation process of the photosensitive glue is characterized in that a cementing agent is prepared, wherein polyether triol is a high polymer material with the characteristics of good mechanical property, good bonding property, thermal oxidation resistance, light resistance and the like, but a large amount of hydroxyl exists on the polyether triol, the water absorption is strong, the hydrolytic stability is poor, and then the hydroxyl group of the polyether triol is blocked after the reaction of isocyanate groups, so that the problem of poor hydrolytic stability of the polyether triol is solved, the good bonding property of the photosensitive glue is kept, the bonding property of the photosensitive glue can be improved, and the problem that the photosensitive property of the photosensitive glue is influenced due to low adhesive force is solved. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114874673-A |
| priorityDate | 2021-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 77.