http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113416177-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-102 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D319-12 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D319-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-20 |
| filingDate | 2021-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-113416177-B |
| titleOfInvention | Main chain degradable photoresist resin monomer and preparation method and application thereof |
| abstract | The invention discloses a main chain degradable photoresist resin monomer and a preparation method and application thereof. The general structural formula of the main chain degradable photoresist resin monomer is: Wherein, R 1 is hydrogen or methyl, and R 2 is selected from an alkylene group, a cycloalkylene group, and a connecting group containing an ester group, a carbonate group, an ether group, and an amide group. The main chain degradable photoresist resin monomer has the advantages of increasing corrosion resistance, improving the adhesion between the resin and the wafer, increasing the dissolution in an alkaline developer (usually TMAH), and helping to improve the edge roughness, Increase the resolution. |
| priorityDate | 2021-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 73.