http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113371673-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e74277852f1aae0a3ff13f59a65456d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2201-0264 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B7-007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B7-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-0015 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81B7-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81B7-00 |
| filingDate | 2021-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_661370e8898bdf04b980e3fc2188a653 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4980f3ad1f33cd84c114fadcc72670e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc8f7e5bccabce2cc0e548d29f273362 |
| publicationDate | 2021-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-113371673-A |
| titleOfInvention | A hybrid integrated sensing microsystem and its single-chip integrated fabrication method |
| abstract | The invention discloses a hybrid integrated sensing micro-system and a single-chip integrated preparation method thereof. The components of the hybrid integrated sensing micro-system include a multi-channel micro-sensor, a micro-sensor signal conditioning circuit, a micro-control unit, a radio frequency circuit module, a peripheral Servo circuits such as equipment and support circuits, all the components are integrated and prepared by bulk silicon process or SOI process, micro-sensors, analog CMOS circuits and digital CMOS circuits are integrated on a single chip, or some components are integrated on a single chip, and then System-level integration with remaining components. The single-chip integrated fabrication method of the integrated sensing microsystem is based on a partially depleted SOI CMOS process, and uses the partially depleted SOI CMOS process to complete most of the micro-sensor plane processing steps, and after the SOICMOS preparation process is completed, the remaining steps are completed. Processing steps for microsensors. The integrated sensing micro-system of the invention has the technical advantages of multi-channel signal parallel detection, long-distance signal transmission, high signal-to-noise ratio, low cost, small size, low power consumption, easy portability and the like. |
| priorityDate | 2021-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.