| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_847454b6ba32b0d64b1af2e5e2dca59c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-34 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32541
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32614
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32651 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32 |
| filingDate |
2019-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb74bdbacae913353e524ca40413ae3d |
| publicationDate |
2021-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-113366600-A |
| titleOfInvention |
Electrode arrangement for a plasma source for performing a plasma treatment |
| abstract |
In order to improve the etching depth and/or the etching uniformity of the substrate, a plasma source with one or more evaporators and two or more electrodes according to the invention is proposed. The use of more than one electrode allows the use of different currents at the electrodes and the time-selective application of these currents, enabling improved control thereof over the plasma generation. |
| priorityDate |
2018-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |