http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113332587-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5a3c84042b90872c364bb090b2295b2 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M2037-0053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M2037-0023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M2037-0046 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M37-0015 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-225 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-308 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61M37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 |
| filingDate | 2021-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73243a49dadc2349d4064f2d3c1e47f7 |
| publicationDate | 2021-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-113332587-A |
| titleOfInvention | Manufacturing process of quartz glass microneedle coating film and quartz glass microneedle device |
| abstract | The invention discloses a manufacturing process of a quartz glass microneedle coating film and a quartz glass microneedle device, and particularly relates to the technical field of quartz glass microneedles, and the manufacturing process comprises the following specific steps: the method comprises the following steps: firstly, manufacturing a non-through hole-shaped groove on the front surface of a silicon wafer by using deep silicon dry etching; step two: generating vapor deposition on the front and back sides of the silicon wafer and the inner wall of the hole by using a thermal oxidation method to form a thick oxide layer; step three: and respectively forming corrosion window patterns on the front side and the back side of the silicon wafer by using a glue coating photoetching method. According to the invention, through the arrangement of the manufacturing process of the quartz glass micro-needle coating, after coating, the surface smoothness of the quartz glass micro-needle is increased, and the quartz glass micro-needle can be quickly and effectively separated from the cell tissue of the epidermal layer after effectively cleaning the skin when entering the epidermal layer of the skin in use, so that the bacterial breeding is avoided, the secondary pollution injury to the skin is prevented, the use effect is good, the skin can be effectively prevented from being inflamed and grown in acne after being used, the skin on the face is bred with black spots, and the use safety is strong. |
| priorityDate | 2021-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 38.