| abstract |
The invention relates to the field of semiconductors, in particular to a method for filling monosilane-hydrogen gas mixture for preparing semiconductor polysilicon and its application. In the filling method, a filling system is used to perform mixed filling of monosilane and hydrogen, Specifically, it includes: respectively testing the purity of monosilane and hydrogen that has been adsorbed and removed by the modified molecular sieve. After passing the test, use inert gas to evacuate and replace the pipeline, and fill the monosilane into the mixed gas storage tank. The pipeline is evacuated and replaced, and then the hydrogen adsorbed and removed by the modified molecular sieve is filled into the mixed gas storage tank to obtain a monosilane-hydrogen gas mixture; the modified molecular sieve is a molecular sieve loaded with calcium oxide. The filling method of the invention can prevent the air in the pipeline from affecting the purity of the mixed gas, improve the impurity removal efficiency by using the modified molecular sieve, and reduce the impurity content in the monosilane and hydrogen mixed gas to a greater extent. |