http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113277499-A

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filingDate 2021-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2f2afa8b3bcec19db867763c4641d7b
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publicationDate 2021-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-113277499-A
titleOfInvention A kind of preparation method and application of silicon-nitrogen co-doped graphene quantum dots
abstract The invention relates to the technical field of quantum dot preparation, in particular to a preparation method and application of silicon-nitrogen co-doped graphene quantum dots based on waste carbon powder. In the invention, the resin in the waste carbon powder is used as the carbon source, and the nitrogen and silicon co-doped graphene quantum dots (N, Si-GQDs) are synthesized by a one-pot hydrothermal method, the synthesis method is simpler, the operation is safe, and the obtained quantum dots It has obvious bactericidal effect on Bacillus subtilis and Escherichia coli. The invention adopts waste carbon powder as a carbon source to prepare nitrogen-silicon co-doped graphene quantum dots, which not only makes reasonable use of waste carbon powder generated in the production process of printers/copiers, reduces waste disposal costs, but also reduces graphite Compared with the production method recorded in the existing literature, the production cost of graphene quantum dots does not need to use citric acid, and the cost can be reduced by 3 times.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114751400-B
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type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 37.