http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113186044-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3281 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3272 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3245 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-04 |
| filingDate | 2021-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-113186044-B |
| titleOfInvention | A kind of preparation method of fluorine-containing cleaning liquid composition |
| abstract | The invention discloses a preparation method of a fluorine-containing cleaning liquid composition. The preparation method comprises the following steps: mixing the following components by mass fraction to obtain the fluorine-containing cleaning liquid composition; 10%-30% oxidant, 0.001-0.01% reduced glutathione, 0.001% ‑0.25% cysteine, 1%‑5% fluoride, 1%‑5% organic base, 0.01%‑2% chelating agent, 0.01%‑2% corrosion inhibitor, 0.5%‑3 % of ammonium carboxylate, 0.01%-1% of EO-PO polymer L31, 0.01%-2% of passivator and water, the water makes up the balance; the sum of the mass fractions of each component is 100%. The fluorine-containing cleaning solution composition prepared by the preparation method of the fluorine-containing cleaning solution composition of the present invention has excellent selectivity to hard masks and good cleaning effect on residues after plasma etching and residues after ashing. |
| priorityDate | 2021-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 152.