| abstract |
The invention discloses a preparation method of a fluorine-containing cleaning liquid composition. The preparation method includes the following steps: mixing the components in the following mass fractions to obtain the fluorine-containing cleaning solution composition; 10%-30% oxidizing agent, 0.001-0.01% reduced glutathione, 0.001% ‑0.25% Cysteine, 1%‑5% Fluoride, 1%‑5% Organic Base, 0.01%‑2% Chelating Agent, 0.01%‑2% Corrosion Inhibitor, 0.5%‑3 % of ammonium carboxylate, 0.01%-1% of EO-PO polymer L31, 0.01%-2% of passivator and water, and water makes up the balance; the sum of the mass fractions of each component is 100%. The fluorine-containing cleaning liquid composition prepared by the preparation method of the fluorine-containing cleaning liquid composition of the present invention has excellent selectivity for hard masks and good cleaning effect on residues after plasma etching and residues after ashing. |