http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113150704-B

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J11-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J11-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J11-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J111-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J7-245
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J11-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J111-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J11-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J11-06
filingDate 2021-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-113150704-B
titleOfInvention Acid-resistant film with good stability and preparation method thereof
abstract The invention provides an acid-resistant film with good stability, which sequentially comprises a base film, an adhesive layer and a release layer. The adhesive layer is at least one of a natural rubber adhesive, an ethylene propylene rubber adhesive, a fluororubber adhesive, a chlorinated polyethylene rubber adhesive, a styrene butadiene rubber adhesive, a butyl rubber adhesive and a chloroprene rubber adhesive. The release layer is selected from a PET release film or a PO release film. The invention provides an acid-resistant film with good stability and a preparation method thereof. According to the invention, the multi-walled carbon nano-tubes subjected to acidification treatment are added, so that the cohesive force of the acid-resistant film adhesive layer is effectively improved, the toughness of the adhesive layer is enhanced, and the acid-resistant film has good effects of resisting acid liquor immersion and preventing residual glue. The acid-resistant film prepared by the invention has good cohesiveness and acid resistance, good overall stability and no adhesive residue after use. The preparation method is simple and convenient, has strong repeatability and operability, is beneficial to large-scale production, and has important significance for the development of the flat panel display technology.
priorityDate 2021-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14792
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID412667134
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID408295384
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5281
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14806
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7253
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7618
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8857
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419557696
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559192
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419558575
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7381
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450756197
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453324982
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID408026572
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456486130
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID104912
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11487
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419544706
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID62703
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419538408
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491805
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID785
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261

Total number of triples: 45.