http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113072678-B
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F283-008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-5024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-672 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F283-00 |
filingDate | 2021-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2022-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2022-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-113072678-B |
titleOfInvention | Polyurea acrylate oligomer and preparation method and application method thereof |
abstract | The invention discloses a polyurea acrylate oligomer, which is prepared by reacting an isocyanate-terminated polyurea intermediate product with hindered amine acrylate, and has a specific structure shown as a formula I or a formula II: wherein R is 1 Residual groups after removal of H from the amino group for polyamines, R 2 Residual groups after the polyol has lost H on the hydroxyl group, R 3 Residual groups after two NCO groups have been lost for diisocyanate compounds. The invention also discloses a preparation method and an application method of the polyurea acrylate oligomer, wherein the preparation method comprises the following steps: mixing the polyurea acrylate oligomer with an active diluent and an initiator, and curing and molding under a light source with corresponding wavelength; and (3) placing the cured sample in an environment with the temperature of 80-150 ℃ and treating for 1-48 hours under an anhydrous condition. After the photocuring sample of the polyurea acrylate oligomer is subjected to aftertreatment at 80-150 ℃, the mechanical property of the photocuring sample is improved, and the post-treatment process of the photocuring resin is relatively simple and convenient, so that the polyurea acrylate oligomer has a wide application prospect. |
priorityDate | 2021-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 48.