http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113025333-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06 |
| filingDate | 2021-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-113025333-B |
| titleOfInvention | Improved indium oxalate dissolving agent composition and etching equipment cleaning process |
| abstract | The invention discloses an improved indium oxalate dissolving agent composition which mainly comprises an alkaline component, a chelating agent, a pH value regulator and water, wherein the chelating agent mainly comprises a chelating agent A and a chelating agent B, the chelating agent A is at least one selected from aminopolycarboxylic acid and salts thereof, the chelating agent B is at least one selected from hydroxypolycarboxylic acid and salts thereof, and the pH value of the improved indium oxalate dissolving agent composition is 9.5-10.5. The improved indium oxalate dissolving agent composition adopts a compound chelating agent system, and utilizes the synergistic chelating property of the two chelating agents in the indium oxalate dissolving agent composition system, so that the solubility of indium oxalate is increased and the dissolving rate is improved. The invention also discloses an etching equipment cleaning process based on the indium oxalate dissolving agent composition. |
| priorityDate | 2021-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.