http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112981344-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2101-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2305-10 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0641 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0036 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3464 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F101-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06 |
| filingDate | 2021-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-112981344-B |
| titleOfInvention | Preparation method of Mo-doped TaN-based photocatalytic film, product and application thereof |
| abstract | The invention relates to the technical field of photocatalytic film materials, in particular to a preparation method of a photocatalytic film based on Mo-doped TaN, a product and application thereof; specifically, argon is used as sputtering gas, nitrogen is used as reaction gas, a double-target co-sputtering method is adopted to prepare a Mo-doped TaN-based photocatalytic film on the surface of a substrate, and the double targets are respectively a tantalum target and a molybdenum target; the invention provides a preparation method of a photocatalytic film based on Mo-doped TaN. The TaN film is applied to the field of photocatalysis for the first time, Mo is selected as a doping agent to improve the photocatalysis performance of the TaN film through a magnetron sputtering vacuum coating technology, so that the light absorption performance of the film and the carrier migration characteristic in the film are improved, and the photocatalysis performance is improved. |
| priorityDate | 2021-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.