| abstract |
The invention provides an etching method of a gold-nickel film layer and application thereof, wherein the etching method comprises the following steps: etching the gold-nickel film layer by using a mixed solution of a first etching solution and a second etching solution; or the gold film layer is etched by using the first etching solution, and then the nickel film layer is etched by using the second etching solution. The etching method provided by the invention has the advantages of easily controlled etching speed, convenient and fast operation, safety, environmental protection, low cost, long service life and no damage to substrates. |