http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112876679-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dde10c3445e9c349968548060829a7ab |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K50-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1071 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D179-08 |
| filingDate | 2021-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89a67638fe1a71faa5c55076f93458e2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c0ccad90b26614b5c63753dad1829e03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd4e16ad0ba96bb342b46667b261ccb0 |
| publicationDate | 2021-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-112876679-A |
| titleOfInvention | A kind of positive photosensitive polyamide compound and its application |
| abstract | The invention discloses a positive-type photosensitive polyamide compound, which is formed by polymerizing dianhydride and diamine, wherein the dianhydride is a carboxylic acid dianhydride, and the structure of the diamine is as follows: The beneficial effects of the present invention are: the positive photosensitive polyamide compound of the present invention contains a side chain unit that can form a side chain oxazole, and can be combined with a diazonaphthoquinone compound to form a photosensitive resin composition. The photosensitive resin composition The prepared photosensitive resin film has the characteristics of high residual film rate, low shrinkage rate, and excellent sensitivity and resolution, so that stable high-resolution patterns can be prepared, which meets the requirements for preparing the above-mentioned electronic components. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114524938-A |
| priorityDate | 2021-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 166.