| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b992e5f7a0ebce9c8b6dff49206f2764
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c7953555ad62861edd396995f8c25b04 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26533
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76243
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-762
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265 |
| filingDate |
2021-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1772e47651b5791c92bcd1da44e323e2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8380eee9916562d1163733cebaacdd87
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d877462c2cd2bfefc74f32bb4806cc18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db4e4820871891260cb23e79cf88ef07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc4cde7c61cd8477475b3d17ce0f6681
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8904e6601fb17dc9a63d5903a4b61765
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9563b9ce40b8f50d9e6d17c35bd37de1 |
| publicationDate |
2021-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-112802728-A |
| titleOfInvention |
Oxygen ion source based on solid electrolyte, ion implanter and application of oxygen ion source and ion implanter in preparation of SOI (silicon on insulator) wafer |
| abstract |
The invention discloses an oxygen ion source based on a solid electrolyte, an ion implanter and application thereof in preparing an SOI wafer. The ion implanter based on the ion source does not need a magnetic analyzer to further screen the extracted ions, and can get rid of the use limitation of the magnetic analyzer, so that the whole ion implanter is greatly simplified in design and greatly reduced in energy consumption. |
| priorityDate |
2021-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |