| abstract |
The present invention provides a metal mask material for OLED which reduces the amount of warpage due to etching, a method for producing the same, and a metal mask. The metal mask material and the metal mask of the present invention are characterized in that, by mass %, Ni: 35.0 to 37.0%, Co; 0.00 to 0.50%, and the remainder is composed of Fe and impurities; the plate thickness is 5.00 μm or more and 50.00 μm or less, a sample of the above-mentioned metal mask material with a side of 100 mm square is etched from one side until the plate thickness of the sample becomes 2/5, and the above-mentioned sample after etching is placed on the The warpage amount, which is the maximum value among the floating amounts of the four corners of the sample when it is on a flat surface, is 5.0 mm or less. |