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filingDate 2020-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7246cbf0026e0962c291197b73b24b1d
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publicationDate 2021-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-112695292-A
titleOfInvention A kind of diamond coating abrasive material and preparation method thereof
abstract The invention discloses a diamond coating abrasive material and a preparation method thereof. It is a new type of diamond abrasive material with ceramic as the substrate, using plasma chemical vapor deposition method, including the following steps: sintered silicon carbide or sintered silicon nitride ceramic sheets are pretreated, cleaned and dried, and then placed in plasma chemical vapor deposition. In the deposition device, methane and hydrogen with different concentration ratios of 0.1%-10% were introduced, and the substrate temperature was 700-1100°C and the gas pressure was 5-16KPa for 4-12h, and finally a diamond coating with a certain thickness was obtained. By changing the pretreatment mode, the substrate temperature, the methane concentration, the gas pressure and the growth time, the present invention prepares a diamond coating with good adhesion and different grain sizes, and the diamond coating is expected to be used as an abrasive material for electronic and optical applications. Fine grinding of grade materials.
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