| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D211-94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D221-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D221-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-3435
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0295
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
2020-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_588f3a105e0bc29cd96b66f0aef4bd8f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47110c4e4efe3a67c0dd4e03756b5187
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03c173801456dce459b4a00ecff8ed53 |
| publicationDate |
2021-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-112666793-A |
| titleOfInvention |
Photoresist composition and pattern forming method |
| abstract |
Disclosed herein is a method comprising forming a radiation-sensitive film on a substrate; wherein the radiation-sensitive film comprises a radiation-sensitive composition comprising a photoacid generator; a quencher; an acid-labile polymer formed from a monomer based on an aromatic monomer and a monomer comprising an acid-decomposable group; and a solvent; exposing the radiation-sensitive film to activating radiation in a patterned manner; and sensitizing the radiation The film is contacted with an alkaline developer to form a resist pattern. |
| priorityDate |
2019-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |