| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7b1962bdeafe58e2f312c308fe511c31 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-03 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
2019-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf808ebe2a1169323e9caa8890ddf078
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54a388c3be272a0397d42bd93919fb49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_617d0744672d2916f3aea4e70eeeb155 |
| publicationDate |
2021-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-112639619-A |
| titleOfInvention |
Fabrication of calcite nanofluidic channels |
| abstract |
The present invention describes methods for fabricating calcite channels in nanofluidic devices. A photoresist layer is coated onto the top surface of the silicon nitride (SiN) substrate. After coating the photoresist layer, the photoresist layer is scanned with an electron beam in a predetermined pattern. The scanned photoresist is developed to expose portions of the top surface of the SiN substrate in a predetermined pattern. The calcite is deposited in a predetermined pattern using atomic layer deposition (ALD) using a calcite precursor gas. The remaining portion of the photoresist layer is removed using a solvent to expose calcite deposited in a predetermined pattern on the top surface of the SiN substrate, wherein the deposited calcite has a width in the range of 50 to 100 nanometers (nm). |
| priorityDate |
2018-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |