Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01073 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76807 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76813 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53257 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7685 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76844 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76849 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76862 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76868 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76816 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53209 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53238 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76829 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76837 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-528 |
filingDate |
2020-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d46460d39af31364e6971778c3b6e12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6b515f78dc088e93fda35e9c9943dc4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94f3aa16f868049113e09a991e0edd8b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cde6814ca5b5d8f997438d7528eb16d2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a0c59f21e21c6a7917cc275afbc0df5 |
publicationDate |
2021-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CN-112563242-A |
titleOfInvention |
semiconductor device |
abstract |
A semiconductor device is provided. The semiconductor device includes a first interlayer insulating film provided on a substrate and having a first trench. The first lower conductive pattern fills the first trench and includes a first valley region and a second valley region spaced apart from each other in a first direction parallel to the upper surface of the substrate. The first valley region and the second valley region are recessed toward the base. The second interlayer insulating film is disposed on the first interlayer insulating film and includes a second trench exposing at least a portion of the first lower conductive pattern. The upper conductive pattern fills the second trench and includes an upper barrier film and an upper filling film disposed on the upper barrier film. The upper conductive pattern at least partially fills the first valley region. |
priorityDate |
2019-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |