| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2019-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_644786a3211b4be1c6d3d75925eeeba5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b59370c95273a2e899d3597c8e3ea489
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1760c09b41ee77c58810735379b0a91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b13087b18e7291bb1b7de8958943e620
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2c71a928b12ce785f75a15cafd6ada8 |
| publicationDate |
2021-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-112534563-A |
| titleOfInvention |
Cleaning system for removing deposits from pumps of drains of substrate processing systems |
| abstract |
An exhaust system for a substrate processing system includes: a free radical generator configured to receive a gas mixture containing halogen species and generate halogen free radicals; a first pump to draw exhaust gas from an exhaust outlet of the processing chamber; and a first valve , which is configured to selectively fluidly connect the outlet of the radical generator to a first pump downstream of the outlet of the processing chamber. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I788183-B |
| priorityDate |
2018-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |