http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112490287-B

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filingDate 2020-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-112490287-B
titleOfInvention Gallium nitride integrated field effect transistor with double working modes and preparation method thereof
abstract The invention discloses a gallium nitride integrated field effect transistor with double working modes and a preparation method thereof. And growing p-GaN on the sidewall of the AlGaN/GaN heterojunction by adopting a selective area epitaxial growth method to form a p-GaN/2DEG junction. P-type and n-type ohmic contact electrodes are respectively prepared on the p-GaN and AlGaN/GaN heterojunction, and an insulated gate electrode is prepared on one side of the AlGaN/GaN heterojunction of the p-GaN/2DEG junction. The GaN integrated field effect transistor has enhancement mode and depletion mode working modes, avoids preparing interconnection metal by adopting a selective area epitaxial process based on AlGaN/GaN heterojunction, improves the functionality of an integrated device, reduces the parasitic effect of the integrated device, and has wide application prospect in the fields of high-performance GaN power devices and logic devices.
priorityDate 2020-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 27.