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publicationDate 2021-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-112490220-A
titleOfInvention Integrated chip and metal-insulator-metal capacitor and method of forming the same
abstract Various embodiments of the invention relate to a metal insulator metal (MIM) capacitor including a diffusion barrier. The bottom electrode overlies the substrate. A capacitor dielectric layer overlies the bottom electrode. The top electrode overlies the capacitor dielectric layer. The top electrode includes a first top electrode layer, a second top electrode layer, and a diffusion barrier layer disposed between the first top electrode layer and the second top electrode layer.
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