| abstract |
The present invention relates to a surface treatment composition, a method for producing the surface treatment composition, a method for surface treatment, and a method for producing a semiconductor substrate. [Problem] To provide a solution that can sufficiently remove organic residues existing on the surface of a polished object made of silicon oxide or polycrystalline silicon. [Solution] A surface treatment composition for treating the surface of a polished object, comprising: a polymer having a structural unit represented by the following formula (1) and water, in formula (1), R 1 is a hydrocarbon group having 1 to 5 carbon atoms, and R 2 is a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms. |