| abstract |
Apparatus, systems, and methods are provided for performing a silicon-containing material removal process on a workpiece. In one example implementation, a method may include generating a species from a process gas in a first chamber using an inductive coupling element. The method may include introducing a fluorine-containing gas and a substance to form a mixture. The mixture may include exposing the silicon structures of the workpiece to the mixture to remove at least a portion of the silicon structures. |