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filingDate 2020-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2021-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-112358082-A
titleOfInvention Wastewater treatment equipment for semiconductor production and processing
abstract The invention discloses a wastewater treatment device for semiconductor production and processing, which comprises a preliminary filter residue component, a secondary transmission pipe, a reaction and detoxification component, a foam removal component, an input pipe and a sedimentation cylinder. The upper side of the sedimentation cylinder is provided with a preliminary filter residue component. The right side of the precipitation cylinder is connected with an input pipe, one end of the input pipe away from the precipitation cylinder is provided with a reaction detoxification component, the upper side of the reaction detoxification component is connected with a secondary transmission pipe, and the secondary transmission pipe is far away from the reaction detoxification component. A foam removing component is arranged on one side of the harmful component. The preliminary filter residue component includes a fixed column, a filter residue tray, a cleaning brush, a filter screen, a filter cloth and a docking column. The top of the sedimentation cylinder is detachably plugged with a docking column. A filter residue tray is fixed at one end of the docking column away from the sedimentation cylinder. The invention adopts the aluminum hydroxide produced by lime powder and aluminum sulfate to precipitate and adsorb fluoride ions, and neutralizes and degrades the fluoride ions to reduce the harm to the human body and the pollution to the environment.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115991478-A
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