http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112322044-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ebe49483d6ecdeaec766faf0d059b70c |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K2003-3045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2201-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2205-025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2205-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2205-03 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-40 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K13-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-544 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-5425 |
filingDate | 2020-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3941aaba3235c4c1e54b467a7bef8e01 |
publicationDate | 2021-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-112322044-A |
titleOfInvention | Preparation method of silicone rubber lost wax mould for artware with complex shape |
abstract | The invention discloses a preparation method of a silicone rubber lost wax mould for artware with a complex shape, belongs to the technical field of high polymer materials, and discloses a rapid mould manufacturing method. The silicon rubber has good flexibility and elasticity, so that the handicraft product with a complex structure, fine patterns and a certain reverse drawing mode inclination can be cloned for manufacturing. The silicon rubber rapid die has the characteristics of short manufacturing period, high product quality, capability of obtaining a plurality of parts in a short period, small deformation, high temperature resistance, acid and alkali resistance and low expansion coefficient. The shrinkage rate is low, the surface molecule inertia is strong, the number of times of mold compounding is large, the shrinkage rate of the mold silica gel is low, the tensile resistance and the elasticity are good, the tearing strength is good, the artware is attractive, and the artware is not deformed. The silica gel is high temperature resistant, still soft under low temperature, can be used for ice-plastic artware, has very good simulation effect, and is a compound die and a precise good die for preparing complex artware. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113956670-A |
priorityDate | 2020-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 52.